|Dept. Applied Physics|
|J.Th.M. De Hosson|
|University of Groningen|
|Prof.dr. J.Th.M. De Hosson
Dr. D. Vainchtein
Dr. V. Ocelik
Dr. Y. Pei
Dr. W. van Dorp
|High-resolution Transmission Electron Microscopy
Scanning Electron Microscopy
Scanning Probe Miicroscopy (AFM. STM. pico and peak force)
Field Ion Microscopy
Scanning Auger Microscopy
Orientation Imaging Microscopy
|•Nanostructured materials: nano-clusters, nano-foams, nano-object
•Nanostructured composite coatings: thin films and applications
•Laser surface and interface engineering: thick coatings and applications
•Heterophase and homophase interfaces: fundamentals and applications
•Advances in microscopy: in situ TEM, SEM, AFM, STM, Picoforce, FIB
for applications in areas such as coating and surface technology, transportation, communications, production systems and data storage and energy storage.see web site for details: http://materials-science.phys.rug.nl/
J.Th.M. De Hosson, In situ Transmission Electron Microscopy on Metals, in Handbook of Nanoscopy, First Edition. Edited by Gustaaf van Tendeloo, Dirk van Dyck,and Stephen J. Pennycook. 2012 Wiley-VCH Verlag GmbH & Co. KGaA.. pp.1097-1151.
Julia R. Greer, Jeff Th.M. De Hosson, Plasticity in small-sized metallic systems: Intrinsic versus extrinsic size effect, Progress in Materials Science (2011) 56: 654–724.
Chang Qiang Chen, Yu Tao Pei, Oleksii Kuzmin, Zhe Feng Zhang, Evan Ma, Jeff Th. M. De Hosson, Intrinsic size effects in the mechanical response of taper-free nanopillars of metallic glass, Phys.Rev. B, B 83, 180201(R) (2011).
V. Ocelík, Ivan Furár, Jeff Th. M. De Hosson, Microstructure and properties of laser clad coatings studied with Orientation Imaging Microscopy, Acta Materialia, 58 (2010) 6763–6772
J.T.M. De Hosson Advances in transmission electron microscopy: In situ straining and in situ compression experiments on metallic glasses. Microscopy Research and Technique 72 (3) 250-260 (2009)
D. Matthews, V.Ocelik, P.M. Bronsveld, J.T.M. De Hosson, An electron microscopy appraisal of tensile fracture in metallic glasses. Acta Materialia 56 (8) 1762-1773 (2008)
W.A. Soer, J.T.M. De Hosson, J.T.M., Minor, A.M., Shan, Z., Asif, S.A.S. & Warren, O.L. Incipient plasticity in metallic thin films. Applied Physics Letters 90 (18) (2007)
|Available microscope in the Dept.Applied Physics-Materials Science group are the following:Transmission electron microscopy:
Jeol JEM-2010F: 200 kV, Field emmision TEM (resolution: Lattice image 0.1 nm, Point image 0.19 nm)
JEM 4000EXII: 400 kV, Point image 0.165 nm
JEM200CX: 200 kV
Scanning Electron Micrsocpy:
Philips XL30 Environmental SEM FEG
Philips XL30 SEM FEG
Philips XL30S SEM FEG
Jeol 7800F FEAM SAM/SEM
TSL EBSD/OIM with digital camera (in XL30 SEM FEG)
Scanning Probe and Optical:
TOF-Field Ion Microscopy: Poschenrieder FIM-TOF-AP
Optical Microscopy (Leitz, Vanox, Nikon)
Surf Nanofocus optical confocal microscope
Veeco Dimension 3100 AFM Veeco Multimode PicoForce AFM
|“For the use of the above-listed facilities of the Dept. Applied-Physics Materials Science Gropup (MK) by researchers outside of the MK group three categories of users are distinguished:1.Users from the supporting research institutes, such as Zernike Institute for Advanced Materials University of Groningen
2.Users from externally financed users of Academic Institutions including STW, FOM, NWO, CW, NanoNed, MicroNed.
Priorities and reservations:
1.Users from all categories have equal rights for access to facilities or equipment if the facilities are not booked by MK members.
2.In case of capacity limits, the manager of MK facilities will decide. In this case users from categories 1 and 2 will have priority.
3.Regulations with respect to facility use are strictly according to the local procedures (e.g., for intake, reservation of equipment) at the MK group.
Reservations are regulated by permission via the MK Scheduler programme set up by Dr. V. Ocelik firstname.lastname@example.org . Users are obliged to strictly follow the instructions from the manager of the MK group or his deputy. Violation of this rule may result in expulsion.
MK will not accept any responsibility for damage, directly or indirectly related to using the MK facilities by the three categories of users mentioned above. All costs involved will be charged to the users.
For further information, please contact: Dr. D. I. Vainchtein manager of MK facilities.D.I.Vainchtein@rug.nl or the group leader prof.dr. J.Th.M. De Hosson email@example.com